Computational design of patterned interfaces using reduced order models
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Updated: Apr 25, 2026

Cell Patterning on Photolithographically Defined Parylene-C: SiO2 Substrates
Published on: March 7, 2014
A J Vattré1, N Abdolrahim2, K Kolluri2
11] CEA, DAM, DIF, F-91297 Arpajon, France [2] MIT Department of Materials Science and Engineering, Cambridge MA, 02139.
Abstract:
Patterning is a familiar approach for imparting novel functionalities to free surfaces. We extend the patterning paradigm to interfaces between crystalline solids. Many interfaces have non-uniform internal structures comprised of misfit dislocations, which in turn govern interface properties. We develop and validate a computational strategy for designing interfaces with controlled misfit dislocation patterns by tailoring interface crystallography and composition. Our approach relies on a novel method for predicting the internal structure of interfaces: rather than obtaining it from resource-intensive atomistic simulations, we compute it using an efficient reduced order model based on anisotropic elasticity theory. Moreover, our strategy incorporates interface synthesis as a constraint on the design process. As an illustration, we apply our approach to the design of interfaces with rapid, 1-D point defect diffusion. Patterned interfaces may be integrated into the microstructure of composite materials, markedly improving performance.
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