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A Polyurethane-Based Positive Photoresist.

Luis García-Fernández1, Alexandre Specht, Aránzazu Del Campo

  • 1Max-Planck-Institut für Polymerforschung, Ackermannweg 10, 55128, Mainz, Germany.

Macromolecular Rapid Communications
|September 16, 2014
PubMed
Summary

Polyurethane-based photoresists offer a low-cost solution for lithography. These materials enable precise micropatterning for 2D and 3D applications using UV or laser light.

Keywords:
photocleavable groupsphotodegradable polymersphotoresistsphotoresponsive polyurethanes

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Area of Science:

  • Materials Science
  • Polymer Chemistry
  • Photolithography

Background:

  • Polyurethanes (PU) are versatile polymers with potential applications in microfabrication.
  • Developing cost-effective and efficient photoresist materials is crucial for advanced lithography.
  • Photocleavable monomers enable light-induced material degradation for patterning.

Purpose of the Study:

  • To formulate and evaluate polyurethane monomer mixtures as low-cost positive tone photoresists.
  • To investigate the photochemical properties of o-nitrobenzyl-based photocleavable monomers in PU.
  • To demonstrate the patterning capabilities of these PU photoresists in 2D and 3D applications.

Main Methods:

  • Formulation of PU monomer mixtures with photocleavable monomers.
  • UV spectroscopy to study photolysis reaction kinetics.
  • Micropatterning using 365 nm UV light exposure.
  • Synthesis of improved o-nitrobiphenylpropyl derivatives.
  • Two-photon excitation lithography using a 780 nm scanning laser.

Main Results:

  • Successful formulation and testing of PU-based photoresists.
  • Demonstration of well-defined micropatterns on 2 μm thick PU films.
  • Enhanced photochemical properties observed with synthesized derivatives.
  • Achieved improved 2D pattern resolution and demonstrated 3D patterning capability.
  • Confirmed the potential of PUs for low-cost lithography.

Conclusions:

  • Polyurethane monomer mixtures are effective low-cost positive tone photoresists.
  • The developed PU photoresists offer versatility and ease of use.
  • This technology shows promise for accessible micro- and nanofabrication techniques.