Effect of hydrofluoric acid (HF) concentration to pores size diameter of silicon membrane
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Updated: Apr 23, 2026

Light Enhanced Hydrofluoric Acid Passivation: A Sensitive Technique for Detecting Bulk Silicon Defects
Published on: January 4, 2016
Norhafizah Burham1, Azrul Azlan Hamzah2, Burhanuddin Yeop Majlis2
1Institute of Microengineering and Nanoelectronics (IMEN), Universiti Kebangsaan Malaysia 43600 Bangi, Selangor, Malaysia Faculty of Electrical Engineering, Universiti Teknologi Mara (UiTM), 40450, Shah Alam, Selangor, Malaysia.
Abstract:
This paper studies parameters which affect the pore size diameter of a silicon membrane. Electrochemical etching is performed in characterise the parameter involved in this process. The parameter has been studied is volume ratio of hydrofluoric acid (HF) and ethanol as an electrolyte aqueous for electrochemical etch. This electrolyte aqueous solution has been mixed between HF and ethanol with volume ratio 3:7, 5:5, 7:3 and 9:1. As a result, the higher volume of HF in this electrolyte gives the smallest pore size diameter compared to the lower volume of HF. These samples have been dipped into HF and ethanol electrolyte aqueous with supplied 25 mA/cm2 current density for 20, 30, 40, and 50 minutes. The samples will inspect under Scanning Electron Microscope (SEM) to execute the pore formations on silicon membrane surface.
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