Photochemistry and radical chemistry under low intensity visible light sources: application to photopolymerization

Jacques Lalevée1, Fabrice Morlet-Savary2, Céline Dietlin2

  • 1Institut de Science des Matériaux de Mulhouse (UMR CNRS-UHA 7361), 15 rue Jean Starcky, 68057 Mulhouse Cedex, France. jacques.lalevee@uha.fr.

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