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Updated: Apr 23, 2026
Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
Vertically oriented, three-dimensionally tapered deep-subwavelength metallic nanohole arrays developed by
Sol-Ah Lee1, Hong Suk Kang, Jung-Ki Park
1Department of Chemical and Biomolecular Engineering, Graduate School of EEWS, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea.
Abstract:
The field-gradient, superficial photo fluidization of azomaterials allows a specific 3D nano-silhouette to be shaped over a large area, so as to get easy access to a 3D-tapered, deep sub-wavelength Au nanohole (20 nm spatial size) array. The squeezing of visible light into the deep sub-wavelength point and the relevant extraordinary optical transmission (EOT) are achieved using this 3D-tapered, 20 nm Au nanohole.
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