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Updated: Apr 23, 2026

Low-energy Cathodoluminescence for OxyNitride Phosphors
Published on: November 15, 2016
Temperature dependence of sensitized Er(3+) luminescence in silicon-rich oxynitride films
1State Key Laboratory of Silicon Materials and Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, People's Republic of China.
Abstract:
The temperature dependence of sensitized Er(3+) emission via localized states and silicon nanoclusters has been studied to get an insight into the excitation and de-excitation processes in silicon-rich oxynitride films. The thermal quenching of Er(3+) luminescence is elucidated by terms of decay time and effective excitation cross section. The temperature quenching of Er(3+) decay time demonstrates the presence of non-radiative trap states, whose density and energy gap between Er(3+) (4) I 13/2 excited levels are reduced by high-temperature annealing. The effective excitation cross section initially increases and eventually decreases with temperature, indicating that the energy transfer process is phonon assisted in both samples.

