Big-data reflection high energy electron diffraction analysis for understanding epitaxial film growth processes

Rama K Vasudevan1, Alexander Tselev, Arthur P Baddorf

  • 1Center for Nanophase Materials Sciences and ‡ORNL Institute for Functional Imaging of Materials, Oak Ridge National Laboratory , Oak Ridge, Tennessee 37831, United States.

ACS Nano
|October 1, 2014
PubMed
Summary

This study introduces advanced statistical analysis for Reflection High Energy Electron Diffraction (RHEED) data, unlocking deeper insights into thin film growth beyond simple intensity oscillations. These big data methods enhance understanding and control of epitaxial film quality.