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Non-null annular subaperture stitching interferometry for steep aspheric measurement.

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    |October 17, 2014
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    A novel non-null annular subaperture stitching interferometry (NASSI) enhances steep aspheric testing by using a partial null lens. This method improves accuracy and efficiency compared to standard ASSI, with validated experimental results.

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    Area of Science:

    • Optical Engineering
    • Metrology
    • Interferometry

    Background:

    • Steep aspheric surfaces present significant metrology challenges.
    • Standard annular subaperture stitching interferometry (ASSI) has limitations in accuracy and efficiency for complex optics.

    Purpose of the Study:

    • To introduce and validate a non-null annular subaperture stitching interferometry (NASSI) method for high-accuracy steep aspheric testing.
    • To improve upon the limitations of traditional ASSI by employing a partial null lens (PNL).

    Main Methods:

    • NASSI utilizes a partial null lens (PNL) to generate reference aspherical wavefronts, reducing the required number of subapertures.
    • Employs reverse optimization reconstruction (ROR) for accurate retrace error correction and subaperture figure error retrieval.
    • Numerical simulations and experimental validation comparing NASSI with standard ASSI and Zygo interferometry.

    Main Results:

    • NASSI significantly reduces the number of subapertures needed while maintaining large overlapping areas for error correction.
    • The method demonstrates decreased error accumulation and increased testing accuracy and efficiency.
    • Numerical simulations confirm NASSI's high accuracy for steep aspheric surfaces.
    • Experimental results show excellent agreement with Zygo interferometer measurements.

    Conclusions:

    • NASSI offers a superior approach for testing steep aspheric optics, overcoming limitations of standard ASSI.
    • The PNL and ROR combination in NASSI enhances measurement precision, efficiency, and dynamic test range.
    • NASSI is a validated and effective technique for advanced optical metrology applications.