Metal-Semiconductor Junctions
Imperfections in Crystal Structure: Non-Stoichiometric Defects
Imperfections in Crystal Structure: Stoichiometric Point Defects
Biasing of Metal-Semiconductor Junctions
Imperfections in Crystal Structure: Point, Line and Plane Defects
Interfacial Electrochemical Methods: Overview
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Updated: Apr 22, 2026

Fabrication of Spatially Confined Complex Oxides
Published on: July 1, 2013
Samrat Choudhury1, Dane Morgan2, Blas Pedro Uberuaga1
1Materials Science and Technology Division, MST-8 Los Alamos National Laboratory, Los Alamos NM 87545.
Misfit dislocations at metal/oxide interfaces cause chemical imbalances, requiring significant metal atom removal and oxygen interstitial insertion for stabilization. Defect composition depends on oxygen partial pressure and balances chemical and strain energies.
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