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Effect of dielectric cladding on active plasmonic device based on InGaAsP multiple quantum wells.
Optics Express
|November 18, 2014
Summary
This study explores amorphous silicon cladding for surface plasmon polariton waveguides, enhancing device modulation. The optimized design compensates for propagation loss using gain media, improving electrical manipulation sensitivity.
Area of Science:
- Optoelectronics
- Nanophotonics
- Materials Science
Background:
- Surface Plasmon Polaritons (SPPs) are light-matter interactions at metal-dielectric interfaces.
- SPP propagation loss on metal films limits device performance.
- Amorphous silicon (α-Si) offers tunable optical properties for integrated photonics.
Purpose of the Study:
- To investigate the use of α-Si cladding in SPP planar waveguides.
- To enhance device modulation response by compensating for SPP propagation loss.
- To optimize SPP propagation for long-range hybrid modes.
Main Methods:
- Fabrication of an SPP planar waveguide with an amorphous silicon cladding layer.
- Integration of multiple quantum wells (MQWs) as electrically pumped gain media.
- Experimental characterization of device response to electrical manipulation.
Main Results:
- The α-Si cladding layer minimized degradation of mode confinement while optimizing the long-range hybrid mode.
- Electrically pumped MQWs compensated for SPP propagation loss on the gold (Au) film waveguide.
- The proposed structure demonstrated a more sensitive response to electrical manipulation compared to devices without cladding.
Conclusions:
- Amorphous silicon cladding is effective in enhancing SPP waveguide performance.
- Gain-compensated SPP propagation enables improved modulation in optoelectronic devices.
- This approach offers a promising route for developing advanced photonic devices.
