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Updated: Apr 20, 2026

The Measurement and Treatment of Suppression in Amblyopia
Published on: December 14, 2012
Is off-frequency overshoot caused by adaptation of suppression?
Mark Fletcher1, Jessica de Boer, Katrin Krumbholz
1, Nottingham, UK.
Abstract:
This study is concerned with the mechanism of off-frequency overshoot. Overshoot refers to the phenomenon whereby a brief signal presented at the onset of a masker is easier to detect when the masker is preceded by a "precursor" sound (which is often the same as the masker). Overshoot is most prominent when the masker and precursor have a different frequency than the signal (henceforth referred to as "off-frequency overshoot"). It has been suggested that off-frequency overshoot is based on a similar mechanism as "enhancement," which refers to the perceptual pop-out of a signal after presentation of a precursor that contains a spectral notch at the signal frequency; both have been proposed to be caused by a reduction in the suppressive masking of the signal as a result of the adaptive effect of the precursor ("adaptation of suppression"). In this study, we measured overshoot, suppression, and adaptation of suppression for a 4-kHz sinusoidal signal and a 4.75-kHz sinusoidal masker and precursor, using the same set of participants. We show that, while the precursor yielded strong overshoot and the masker produced strong suppression, the precursor did not appear to cause any reduction (adaptation) of suppression. Predictions based on an established model of the cochlear input-output function indicate that our failure to obtain any adaptation of suppression is unlikely to represent a false negative outcome. Our results indicate that off-frequency overshoot and enhancement are likely caused by different mechanisms. We argue that overshoot may be due to higher-order perceptual factors such as transient masking or attentional diversion, whereas enhancement may be based on mechanisms similar to those that generate the Zwicker tone.
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