Biasing of Metal-Semiconductor Junctions
Biasing of P-N Junction
Metal-Semiconductor Junctions
Debye–Huckel–Onsager Conductance Equation
P-N junction
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Updated: Apr 19, 2026

Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities
Published on: July 24, 2015
Wen-kai Zhao1, Bin Cui, Chang-feng Fang
1School of Physics, State Key Laboratory of Crystal Materials, Shandong University, Jinan 250100, People's Republic of China. liuds@sdu.edu.cn.
This study demonstrates current rectification in novel graphyne/graphene nanoribbon junctions. Tuning oxygen atom placement controls rectification direction and reveals negative differential resistance, offering insights for electronic device design.
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