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Updated: Apr 19, 2026

Growth and Electrostatic/chemical Properties of Metal/LaAlO3/SrTiO3 Heterostructures
Published on: February 8, 2018
Electronic reconstruction at the isopolar LaTiO(3)/LaFeO(3) interface: an X-ray photoemission and density-functional
J E Kleibeuker1, Z Zhong2, H Nishikawa3
1Faculty of Science and Technology and MESA+Institute for Nanotechnology, University of Twente, 7500 AE Enschede, Netherlands and Physikalisches Institut, University of Würzburg, 97074 Würzburg, Germany.
Abstract:
We report the formation of a nonmagnetic band insulator at the isopolar interface between the antiferromagnetic Mott-Hubbard insulator LaTiO_{3} and the antiferromagnetic charge transfer insulator LaFeO_{3}. By density-functional theory calculations, we find that the formation of this interface state is driven by the combination of O band alignment and crystal field splitting energy of the t_{2g} and e_{g} bands. As a result of these two driving forces, the Fe 3d bands rearrange and electrons are transferred from Ti to Fe. This picture is supported by x-ray photoelectron spectroscopy, which confirms the rearrangement of the Fe 3d bands and reveals an unprecedented charge transfer up to 1.2±0.2 e^{-}/interface unit cell in our LaTiO_{3}/LaFeO_{3} heterostructures.
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