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Low-energy plasma focus device as an electron beam source.

Muhammad Zubair Khan1, Yap Seong Ling2, Ibrar Yaqoob3

  • 1Plasma Technology Research Center, Department of Physics, Faculty of Science, University of Malaya, 50603 Kuala Lumpur, Malaysia ; Department of Physics, Federal Urdu University of Arts, Science & Technology, 45320 Islamabad, Pakistan.

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Researchers developed a method to measure electron beam properties from a plasma focus device. This high-flux electron beam, with an average energy of 500 keV, shows potential for material science applications.

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Area of Science:

  • Plasma Physics
  • Electron Beam Generation
  • X-ray Spectroscopy

Background:

  • Plasma focus devices are capable of generating high-energy electron beams.
  • Accurate characterization of these electron beams is crucial for understanding their properties and potential applications.
  • Simultaneous measurement of electron beam intensity and energy presents a technical challenge.

Purpose of the Study:

  • To develop and implement a technique for simultaneous measurement of electron beam intensity and energy.
  • To characterize the electron beam produced by a low-energy plasma focus device.
  • To explore the potential applications of the generated electron beam in material sciences.

Main Methods:

  • Utilized a low-energy plasma focus device as the electron beam source.
  • Employed a Faraday cup and an array of filtered PIN diodes for simultaneous intensity and energy measurements.
  • Registered beam-target X-rays using X-ray spectrometry with copper and lead targets.

Main Results:

  • Optimized system operation in Argon at 1.7 mbar.
  • Achieved maximum electron beam charge of 0.31 μC and density of 13.5 × 10^16/m^3.
  • Determined the average electron beam energy to be 500 keV.

Conclusions:

  • The developed technique allows for effective simultaneous measurement of electron beam parameters.
  • The characterized electron beam exhibits high flux and significant energy.
  • The high-flux electron beam shows promising potential for applications in material sciences.