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Methods of Ex Situ and In Situ Investigations of Structural Transformations: The Case of Crystallization of Metallic Glasses
Published on: June 7, 2018
Structure and bonding in amorphous iron carbide thin films.
Andrej Furlan1, Ulf Jansson, Jun Lu
1Thin Film Physics Division, Department of Physics, Chemistry and Biology (IFM), Linköping University, SE-58183 Linköping, Sweden.
We studied amorphous iron-carbon (Fe(1-xCx)) thin films, finding their electrical resistivity increases with carbon content. This suggests controlling the amorphous structure can tune thin film coating properties.
Area of Science:
- Materials Science
- Solid State Physics
- Nanotechnology
Background:
- Amorphous thin films offer tunable properties.
- Understanding the structure-property relationship in amorphous materials is crucial for advanced applications.
Purpose of the Study:
- To investigate the amorphous structure, chemical bonding, and electrical properties of magnetron sputtered Fe(1-xCx) thin films.
- To correlate the observed properties with the material's nanostructure and chemical composition.
Main Methods:
- X-ray diffraction (XRD), electron diffraction, and transmission electron microscopy (TEM) for structural analysis.
- Pair distribution function (PDF) analysis for short-range order.
- X-ray photoelectron spectroscopy (XPS) and X-ray absorption spectroscopy (XAS) for chemical bonding and electronic structure.
- Four-point probe measurements for electrical resistivity.
Main Results:
- Fe(1-xCx) films exhibit an amorphous nanocomposite structure with Fe-rich carbide and carbon-rich matrix domains.
- Close-range order resembles crystalline Fe(3)C, with graphene-like structures appearing at high carbon content.
- Resistivity increases exponentially with carbon content, from ~200 to ~1200 μΩ cm.
- Electronic structure shows changes in unoccupied 3d and C 2p states due to charge transfer at interfaces.
Conclusions:
- The electrical resistivity of amorphous Fe(1-xCx) films is primarily dependent on total carbon content.
- Control over amorphous domain structure offers a pathway to modify the resistivity of transition metal carbide thin films.
- Findings enable new possibilities for designing advanced thin film coatings.
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