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Updated: Apr 18, 2026
Epitaxial Nanostructured α-Quartz Films on Silicon: From the Material to New Devices
Published on: October 6, 2020
Directed self-assembly of silicon-containing block copolymer thin films
Michael J Maher1, Charles T Rettner, Christopher M Bates
1Department of Chemistry and §McKetta Department of Chemical Engineering, The University of Texas at Austin , Austin, Texas 78712, United States.
Abstract:
The directed self-assembly (DSA) of lamella-forming poly(styrene-block-trimethylsilylstyrene) (PS-PTMSS, L0=22 nm) was achieved using a combination of tailored top interfaces and lithographically defined patterned substrates. Chemo- and grapho-epitaxy, using hydrogen silsesquioxane (HSQ) based prepatterns, achieved density multiplications up to 6× and trench space subdivisions up to 7×, respectively. These results establish the compatibility of DSA techniques with a high etch contrast, Si-containing BCP that requires a top coat neutral layer to enable orientation.
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