Accelerated oxygen exchange kinetics on Nd2NiO(4+δ) thin films with tensile strain along c-axis

The influence of the lattice strain on the kinetics of the oxygen reduction reaction (ORR) was investigated at the surface of Nd2NiO4+δ (NNO). Nanoscale dense NNO thin films with tensile, compressive and no strain along the c-axis were fabricated by pulsed laser deposition on single-crystalline Y0.08Zr0.92O2 substrates. The ORR kinetics on the NNO thin film cathodes was investigated by electrochemical impedance spectroscopy at 360-420 °C in air. The oxygen exchange kinetics on the NNO films with tensile strain along the c-axis was found to be 2-10 times faster than that on the films with compressive strain along the c-axis. A larger concentration of oxygen interstitials (δ) is found in the tensile NNO films compared to the films with no strain or compressive strain, deduced from the measured chemical capacitance. This is consistent with the increase in the distance between the NdO rock-salt layers observed by transmission electron microscopy. The surface structure of the nonstrained and tensile strained films remained stable upon annealing in air at 500 °C, while a significant morphology change accompanied by the enrichment of Nd was found at the surface of the films with compressive strain. The faster ORR kinetics on the tensile strained NNO films was attributed to the ability of these films to incorporate oxygen interstitials more easily, and to the better stability of the surface chemistry in comparison to the nonstrained or compressively strained films.