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Updated: Apr 17, 2026

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
Giant photoamplification in indirect-bandgap multilayer MoS2 phototransistors with local bottom-gate structures
Junyeon Kwon1, Young Ki Hong, Gyuchull Han
1Multi-Functional Nano/Bio Electronics Lab, Kyung Hee University, Gyeonggi, 446-701, South Korea.
Abstract:
Local-gate multilayer MoS2 phototransistors exhibit a photoresponsivity of up to 342.6 A W(-1) , which is higher by 3 orders of magnitude than that of global-gate multilayer MoS2 phototransistors. These simulations indicate that the gate underlap is critical for the enhancement of the photoresponsivity. These results suggest that high photoresponsivity can be achieved in indirect-bandgap multilayer MoS2 phototransistors by optimizing the optoelectronic design.
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