Nanopatterned graphene on a polymer substrate by a direct peel-off technique

A graphene (Gr) on a polyimide (PI) polymer film (Gr-PI film), obtained by a direct peel-off technique, is proposed and investigated. Thanks to its high transparency, electrical conductivity, mechanical strength, and chemical durability, the Gr-PI film is an ideal substrate for flexible electronic and optoelectronic devices, including transistors, light-emitting diodes, and plasmonic antennas. It is obtained using a straightforward method. After spin coating and curing a PI film on Gr previously grown on Cu, one can separate the Gr-PI film from the Cu foil thanks to the difference in the adhesive energy between the Gr-Cu and Gr-PI interfaces. The resulting Gr-PI film shows an average electrical sheet resistance ranging from 520 to 860 Ω/sq and a very high optical transmission (>90%), which have allowed the demonstration of a transparent heater. The surface morphology of the Gr-PI film follows that of the Cu foil, with the latter maintaining its surface properties and allowing in this way its reuse in subsequent chemical vapor deposition growth. The method can also be applied to patterned Gr, as is demonstrated for nanosize ribbons with a width of a few tens of nanometers.