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Related Experiment Video

Updated: Apr 16, 2026

Fabrication of Gradient Nanopattern by Thermal Nanoimprinting Technique and Screening of the Response of Human Endothelial Colony-forming Cells

Fabrication of Gradient Nanopattern by Thermal Nanoimprinting Technique and Screening of the Response of Human Endothelial Colony-forming Cells

Published on: July 1, 2018

Production of centimeter-scale gradient patterns by graded elastomeric tip array.

Jin Wu¹, Jianmin Miao¹

¹School of Mechanical and Aerospace Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore.

ACS Applied Materials & Interfaces

|March 13, 2015

Summary

This summary is machine-generated.

Researchers developed a novel lithography technique using a polydimethylsiloxane (PDMS) tip array to create large-area gradient patterns. This method enables precise control over feature size and height for diverse applications in materials science.

Keywords:

3D structures PDMS tip array elastomeric photomask gradient patterns photolithography

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Area of Science:

Materials Science
Nanotechnology
Surface Engineering

Background:

Gradient surfaces with varying chemical and/or morphological properties are crucial for advancements in biology, chemistry, and materials science.
Fabricating these gradient patterns over large areas with controlled feature sizes and heights presents a significant challenge.

Purpose of the Study:

To develop a unique lithographic strategy for fabricating 2D and 3D gradient patterns over centimeter-scale areas.
To enable gradual variations in feature size (sub-100 nm to several microns) and height on a single substrate.

Main Methods:

Utilized a large-area polydimethylsiloxane (PDMS) tip array with programmable tip apex as a conformal photomask in near-field photolithography.
Developed a novel strategy to create PDMS tip arrays with graded apex sizes.
Employed gradient exposure dose to achieve 3D gradient patterns with spatially varying feature height.

Main Results:

Successfully fabricated 2D gradient patterns with lateral feature sizes ranging from sub-100 nm to several microns over macroscopic areas.
Enabled the creation of 3D gradient patterns with controlled variations in feature height.
Demonstrated that gradient feature size formation is influenced by gradient contact areas and/or exposure dose gradients.

Conclusions:

The developed lithography strategy offers a facile and flexible approach for manufacturing diverse functional gradient structures.
This technique combines advantages of wide feature size range, simplicity, high-throughput, low-cost, and diversified feature shapes.
The method holds significant potential for applications requiring precisely engineered gradient surfaces.