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Updated: Apr 16, 2026

Tuning Oxide Properties by Oxygen Vacancy Control During Growth and Annealing
Published on: June 9, 2023
Initial stages of oxide formation on the Zr surface at low oxygen pressure: An in situ FIM and XPS study
I Bespalov1, M Datler1, S Buhr1
1Institute of Materials Chemistry, Vienna University of Technology, Getreidemarkt 9, 1060 Vienna, Austria.
Abstract:
An improved methodology of the Zr specimen preparation was developed which allows fabrication of stable Zr nanotips suitable for FIM and AP applications. Initial oxidation of the Zr surface was studied on a Zr nanotip by FIM and on a polycrystalline Zr foil by XPS, both at low oxygen pressure (10(-8)-10(-7)mbar). The XPS data reveal that in a first, fast stage of oxidation, a Zr suboxide interlayer is formed which contains three suboxide components (Zr(+1), Zr(+2) and Zr(+3)) and is located between the Zr surface and a stoichiometric ZrO2 overlayer that grows in a second, slow oxidation stage. The sole suboxide layer has been observed for the first time at very early states of the oxidation (oxygen exposure ≤ 4L). The Ne(+) FIM observations are in accord with a two stage process of Zr oxide formation.
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