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Self-assembly of diblock copolymer confined in an array-structure space
Xuehao He1, Zhixiang Zou1, Di Kan1
1Department of Chemistry, School of Science, Tianjin University, and Collaborative Innovation Center of Chemical Science and Engineering (Tianjin), Tianjin 300072, China.
The Journal of Chemical Physics
|March 16, 2015
Summary
Researchers used polymeric self-consistent field theory to explore diblock copolymer pattern formation within 2D pillar arrays. This study reveals how pillar geometry and surface fields control novel nanostructure formation in advanced materials.
Area of Science:
- Advanced Materials Science
- Polymer Physics
- Nanotechnology
Background:
- Combining top-down and bottom-up fabrication is key for creating ordered nanostructures.
- Diblock copolymers self-assemble into diverse microphase patterns.
Purpose of the Study:
- To investigate diblock copolymer pattern formation in 2D confined pillar arrays.
- To understand how confinement geometry influences nanostructure development.
Main Methods:
- Utilized polymeric self-consistent field theory simulations.
- Employed 2D confinement systems with pillar arrays of varying shapes (squares, rectangles, triangles).
Main Results:
- Microphase structure is highly sensitive to pillar pitch, shape, size, rotation, and surface fields.
- Array structures induce novel phase patterns and control their location and orientation.
- Methods for tuning commensuration and frustration in array-structure confinement were proposed and examined.
Conclusions:
- 2D pillar arrays offer precise control over diblock copolymer nanostructure formation.
- This approach enables the creation of novel, ordered nanostructures for advanced materials manufacturing.
