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Updated: Apr 15, 2026

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Nanostructured vanadium carbide thin films produced by RF magnetron sputtering.

Suat Pat1, Şadan Korkmaz1

  • 1Physics Department, Eskişehir Osmangazi University, Turkey.

Scanning
|April 1, 2015
PubMed
Summary

Nanostructured vanadium carbide thin films exhibit transparency and high wettability. Adjusting nitrogen concentration in the radio frequency (RF) buffer gas influences film properties like refractive index and surface morphology.

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Area of Science:

  • Materials Science
  • Thin Film Technology
  • Surface Chemistry

Background:

  • Nanostructured materials offer unique properties due to their high surface area.
  • Vanadium carbide (VC) is a promising material for various applications.
  • Understanding thin film properties is crucial for material design.

Purpose of the Study:

  • To deposit and characterize nanostructured vanadium carbide thin films.
  • To investigate the optical and surface properties of these films.
  • To determine the effect of nitrogen concentration on film characteristics.

Main Methods:

  • Deposition of vanadium carbide thin films on glass substrates.
  • Optical property analysis (transparency).
  • Refractive index calculation using the Drude model.
Keywords:
AFMSputtered filmsXRD

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  • Surface property analysis via contact angle measurements and surface free energy determination.
  • Investigation of radio frequency (RF) buffer gas composition (nitrogen content).
  • Main Results:

    • All vanadium carbide thin films were transparent in the optical region.
    • High wettability was observed for the coated surfaces.
    • Surface free energies were found to be similar across samples.
    • Nitrogen concentration in the RF buffer gas significantly influenced microstructure, refractive index, surface morphology, surface free energy, and film thickness.

    Conclusions:

    • Nanostructured vanadium carbide thin films possess desirable optical and surface properties.
    • Tunable film characteristics are achievable by controlling nitrogen content in the RF buffer gas.
    • This control allows for optimization of vanadium carbide thin films for specific applications.