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Related Experiment Video

Updated: Apr 15, 2026

Fabrication and Characterization of High-Q Silicon Nitride Membrane Resonators
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Sub-micron silicon nitride waveguide fabrication using conventional optical lithography.

Yuewang Huang, Qiancheng Zhao, Lobna Kamyab

    Optics Express
    |April 4, 2015
    PubMed
    Summary
    This summary is machine-generated.

    We developed a new method for fabricating sub-micron silicon nitride waveguides using standard lithography. This technique yields low propagation loss and high nonlinearity, making it ideal for nonlinear optics and sensing applications.

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    Area of Science:

    • Materials Science
    • Optics and Photonics
    • Nanotechnology

    Background:

    • Sub-micron waveguides are crucial for advanced photonic integrated circuits.
    • Existing fabrication methods often face challenges with precision and scalability.
    • Silicon nitride offers excellent optical properties for waveguiding applications.

    Purpose of the Study:

    • To demonstrate a novel, cost-effective technique for fabricating sub-micron silicon nitride waveguides.
    • To characterize the optical performance of the fabricated waveguides for nonlinear optics.
    • To explore potential applications in plasmonics and sensing.

    Main Methods:

    • Utilized conventional contact lithography with MEMS-grade photomasks.
    • Employed potassium hydroxide anisotropic etching of silicon for line reduction and roughness smoothing.
    • Measured propagation loss and nonlinear coefficient of the fabricated waveguides.

    Main Results:

    • Achieved sub-micron silicon nitride waveguides with a propagation loss of 0.8 dB/cm.
    • Measured a high nonlinear coefficient (γ) of 0.3/W/m.
    • Predicted low anomalous dispersion (<100 ps/nm/km).

    Conclusions:

    • The demonstrated fabrication technique is suitable for producing high-performance silicon nitride waveguides.
    • The waveguides exhibit excellent properties for nonlinear optical applications.
    • Naturally formed surface channels offer potential for plasmonics and enhanced quantum efficiency in sensing.