Related Experiment Video
Updated: Apr 14, 2026

11:42
Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities
Published on: July 24, 2015
16.3K
Ballistic bipolar junctions in chemically gated graphene ribbons
Jens Baringhaus1, Alexander Stöhr2, Stiven Forti2
1Institut für Festkörperphysik, Leibniz Universität Hannover, Germany.
Scientific Reports
|April 22, 2015
Summary
Researchers created ultra-narrow graphene pn-junctions for studying Klein tunneling. These 5 nm junctions exhibit ballistic transmission, acting as polarizers and analyzers for electron transport.
Area of Science:
- Condensed Matter Physics
- Materials Science
- Nanotechnology
Background:
- Studying Klein tunneling phenomena requires ballistic graphene pn-junctions.
- Previous methods resulted in wider junctions (hundreds of nanometers) compared to ideal nano-scaled structures.
Purpose of the Study:
- To realize truly nano-scaled graphene pn-junctions for Klein tunneling research.
- To investigate ballistic transmission and polarization effects in these junctions.
Main Methods:
- Intercalation of Germanium (Ge) under a buffer layer of pre-structured Silicon Carbide (SiC) samples.
- Local tunneling spectroscopy to determine junction width.
- Four-tip scanning tunneling microscopy (STM) for systematic transport measurements.
Main Results:
- Successfully fabricated nano-scaled pn-junctions with a width as narrow as 5 nm.
- Directly demonstrated ballistic transmission across the junctions using transport measurements.
- Observed pn-junctions acting as polarizers/analyzers, with transparency in npn/pnp structures under specific conditions.
Conclusions:
- Ge intercalation provides a method for creating ultra-narrow graphene pn-junctions.
- These junctions facilitate the study of Klein tunneling due to ballistic transmission.
- The observed polarization effects are linked to suppressed electron transmission away from normal incidence.
Related Concept Videos
Bipolar Junction Transistor
1.9K
Bipolar Junction Transistors (BJTs) are essential elements in electronic circuits, playing a crucial role in the functionality of amplifiers, memories, and microprocessors. These transistors can be designed as NPN or PNP based on their doping patterns. They consist of three layers: the emitter, base, and collector. The configuration of these layers and their respective doping levels—with N-type or P-type impurities—define the transistor's type and its operational...
1.9K
Biasing of Metal-Semiconductor Junctions
857
Biasing metal-semiconductor junctions involves applying a voltage across the junction. Specifically, the metal is connected to a voltage source, while the semiconductor is grounded. This technique is essential for controlling the direction and magnitude of current flow in electronic devices, including diodes, transistors, and photovoltaic cells.
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...
857
Metal-Semiconductor Junctions
1.4K
The contact of metal and semiconductor can lead to the formation of a junction with either Schottky or Ohmic behavior.
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
1.4K
Biasing of P-N Junction
2.7K
The operation of a p-n junction diode involves various biasing conditions, including forward bias, reverse bias, and equilibrium.
In equilibrium, no external voltage is applied across the p-n junction. The depletion region is formed at the junction interface due to the diffusion of carriers, which leaves behind charged dopants, acceptors on the p-side, and donors on the n-side. These immobile charges create an electric field that prevents further diffusion of carriers. The related energy band...
In equilibrium, no external voltage is applied across the p-n junction. The depletion region is formed at the junction interface due to the diffusion of carriers, which leaves behind charged dopants, acceptors on the p-side, and donors on the n-side. These immobile charges create an electric field that prevents further diffusion of carriers. The related energy band...
2.7K
Switching of BJT
1.0K
Switching behavior in Bipolar Junction Transistors (BJTs) is a fundamental aspect utilized in various electronic circuits, particularly for digital logic applications like switches and amplifiers. In a typical switching circuit, a BJT alternates between cut-off and saturation modes, corresponding to the "off" and "on" states, respectively, thus behaving like an ideal switch.
Cut-off Mode ("Off" State): In this state, both the emitter-base and collector-base junctions are...
Cut-off Mode ("Off" State): In this state, both the emitter-base and collector-base junctions are...
1.0K
Biasing of FET
980
Biasing a Junction Field Effect Transistor (JFET) is crucial for setting operational parameters and ensuring efficient functioning in electronic circuits. JFETs are characterized by using a single carrier type in N-channel or P-channel configurations, where the channel is surrounded by PN junctions. These junctions are central to the device's ability to control current flow.
In an N-channel JFET, the structure consists of N-type material forming the channel on a P-type substrate, with the...
In an N-channel JFET, the structure consists of N-type material forming the channel on a P-type substrate, with the...
980

