Analysis of the Gas Phase Kinetics Active during GaN Deposition from NH3 and Ga(CH3)3

Stefano Ravasio1, Takeshi Momose2, Katsushi Fujii3

  • 1†Dipartimento di Chimica, Materiali e Ingegneria Chimica "Giulio Natta", Politecnico di Milano, via Mancinelli 7, 20131 Milano, Italy.

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