Related Experiment Video
Updated: Apr 13, 2026

Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
Published on: December 5, 2015
Carrier transport at the metal-MoS2 interface
Faisal Ahmed1, Min Sup Choi, Xiaochi Liu
1Samsung-SKKU Graphene Center (SSGC), SKKU Advanced Institute of Nano-Technology (SAINT), Sungkyunkwan University, 2066, Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do 440-746, Korea.
This study reveals how electronic transport transitions between thermionic emission and tunneling at metal-MoS2 interfaces in field-effect transistors (FETs). Understanding these carrier transport mechanisms is key for designing advanced 2D electronic devices.
Area of Science:
- Materials Science
- Condensed Matter Physics
- Nanotechnology
Background:
- Field-effect transistors (FETs) are crucial electronic components.
- Understanding charge transport at metal-semiconductor interfaces is vital for device performance.
- Molybdenum disulfide (MoS2) is a key 2D material for next-generation electronics.
Purpose of the Study:
- To investigate the electronic transport mechanisms at the metal electrode-MoS2 channel interface.
- To analyze the temperature-dependent contact resistance (Rc) and its implications.
- To elucidate the transition between different carrier transport regimes.
Main Methods:
- Fabrication of FET devices with metal electrodes (Pd, Cr) and MoS2 channels.
- Temperature-dependent electrical transport measurements.
- Analysis of current-voltage (I-V) characteristics to determine tunneling mechanisms.
- Analytical calculations to extract contact resistance (Rc).
Main Results:
- A transition from thermionic emission (high temperature) to tunneling (low temperature) was observed for carrier transport.
- For Pd-MoS2 contacts, direct tunneling at low bias and Fowler-Nordheim tunneling at high bias were identified.
- Cr-MoS2 contacts exhibited only direct tunneling across the applied bias range.
- Experimental Rc data were consistent with analytical calculations.
Conclusions:
- The study details the transition in carrier transport mechanisms at metal-MoS2 interfaces.
- Findings provide crucial insights for designing flexible and transparent electronics using 2D materials.
- Understanding these transport phenomena is essential for optimizing future electronic device architectures.
Related Concept Videos
Metal-Semiconductor Junctions
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
Carrier-Mediated Transport
Active transport involves two types of membrane-spanning transporters: uptake and efflux. Uptake transporters are expressed in the small...
Electron Carriers
Over the many stages of cellular respiration, glucose breaks down into carbon dioxide and water. Electron carriers pick up electrons lost by glucose in these reactions, temporarily storing and releasing them into the electron...
Carrier Transport
Drift Current:
The drift of charge carriers is started by an external electric field (E). Charged particles, such as electrons and holes, experience an acceleration between collisions with lattice atoms. For electrons, this results in a drift velocity (vd) given by:
MOSFET
In an n-MOSFET, the structure includes n-type source and drain...
Biasing of Metal-Semiconductor Junctions
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...

