Natural nanomorphous Ni/NiO magnetic multilayers: structure and magnetism of the high-Ar pressure series

Natural nanomorphous Ni/NiO multilayers have exhibited interesting magnetic properties, such as an unusual positive surface anisotropy and perpendicular magnetic anisotropy. Most attention has been paid to multilayers prepared by radio frequency magnetron sputtering under relatively low (3 x 10(-3) mbar) Ar pressure. Here we report on the correlation between structural and magnetic properties for a new series of multilayers, prepared under relatively high (3 x 10(-2) mbar) Ar pressure. The crystalline Ni individual layer thickness ranges between 5-8 nm. The amorphous NiO layer thickness is constant, about 1.1 nm thick. X-ray reflectivity showed that in some of the multilayers the high-order Bragg peaks become broader and diminish quickly. Cross-section transmission electron microscopy reveals that this occurs because the first bilayers are formed in accordance to the growth conditions, while the ones near the top are vanished. Despite the deterioration of the interface quality, all samples show tendency for perpendicular magnetic anisotropy even for large bilayer thickness of about 9 nm. Similar tendency is observed even by a 330 nm thick non-multilayered Ni film grown under the same conditions. This observation reveals the important role of strain and magnetoelastic anisotropy as a source of perpendicular magnetic anisotropy in the Ni/NiO multilayers.