Related Experiment Video
Updated: Apr 12, 2026

Preparation of Expanded Chitin Foams and their Use in the Removal of Aqueous Copper
Published on: February 27, 2021
Citric Acid Enhanced Copper Removal by a Novel Multi-amines Decorated Resin
Chen Ling1, Fuqiang Liu1, Zhiguo Pei2
1State Key Laboratory of Pollution Control and Resource Reuse, School of the Environment, Nanjing University, Nanjing 210023, P. R. China.
Abstract:
Cu removal by a novel multi-amines decorated resin (PAMD) from wastewater in the absence or presence of citric acid (CA) was examined. Adsorption capacity of Cu onto PAMD markedly increased by 186% to 5.07 mmol/g in the presence of CA, up to 7 times of that onto four commercial resins under the same conditions. Preloaded and kinetic studies demonstrated adsorption of [Cu-CA] complex instead of CA site-bridging and variations of adsorbate species were qualitatively illustrated. The interaction configuration was further studied with ESI-MS, FTIR, XPS and XANES characterizations. The large enhancement of Cu adsorption in Cu-CA bi-solutes systems was attributed to mechanism change from single-site to dual-sites interaction in which cationic or neutral Cu species (Cu(2+) and CuHL(0)) coordinated with neutral amine sites and anionic complex species (CuL(-) and Cu2L2(2-)) directly interacted with protonated amine sites via electrostatic attraction, and the ratio of the two interactions was approximately 0.5 for the equimolar bi-solutes system. Moreover, commonly coexisting ions in wastewaters had no obvious effect on the superior performance of PAMD. Also, Cu and CA could be recovered completely with HCl. Therefore, PAMD has a great potential to efficiently remove heavy metal ions from wastewaters in the presence of organic acids.
More Related Videos
Related Concept Videos
Extraction: Advanced Methods
Precipitation and Co-precipitation
Microbial Leaching
Ion Exchange
Electrodeposition
Electrodeposition can...
Masking and Demasking Agents
There are many masking agents, such as cyanide, fluoride, triethanolamine, thiourea, and 2,3-bis(sulfanyl)propan-1-ol (formerly 2,3-dimercapto-1-propanol), with the masking agent chosen based on...

