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Semi-analytical model of arrayed waveguide grating in SOI using Gaussian beam approximation.

R Sidharth, B K Das

    Applied Optics
    |May 14, 2015
    PubMed
    Summary
    This summary is machine-generated.

    Arrayed waveguide gratings are crucial for silicon-on-insulator optical interconnects. A new semi-analytical model accurately predicts performance degradation from fabrication errors, like waveguide width variations.

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    Area of Science:

    • Photonics and Optical Engineering
    • Integrated Optics
    • Semiconductor Device Physics

    Background:

    • Arrayed waveguide gratings (AWGs) are key components in silicon-on-insulator (SOI) based CMOS optical interconnects.
    • Device performance is highly sensitive to fabrication errors, necessitating accurate modeling for tolerance analysis.

    Purpose of the Study:

    • To develop a semi-analytical model for analyzing AWG performance and fabrication tolerances.
    • To estimate phase errors caused by waveguide inhomogeneities using Gaussian beam approximation.

    Main Methods:

    • Developed a semi-analytical model employing Gaussian beam approximation for guided mode profiles.
    • Validated the model against numerical methods and experimental data.
    • Analyzed the impact of probabilistic waveguide width variations on device performance.

    Main Results:

    • The semi-analytical model accurately predicts output spectrum and phase errors.
    • Waveguide width variations of ~5 nm can lead to significant cross-talk degradation (~40 dB or ~25 dB depending on substrate thickness).
    • The model provides insights into fabrication tolerances for SOI AWG devices operating at ~1550 nm.

    Conclusions:

    • The developed semi-analytical model offers an efficient alternative to computationally intensive numerical methods for AWG design.
    • Understanding fabrication tolerances is critical for achieving high-performance optical interconnects.
    • The model aids in optimizing AWG design for reliable operation in SOI platforms.