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Enhancing the Reactivity of Al/CuO Nanolaminates by Cu Incorporation at the Interfaces
Lorena Marín1,2, Charith E Nanayakkara3, Jean-Francois Veyan3
1†LAAS-CNRS, 7 Avenue du colonel Roche, F-31077 Toulouse, France.
Abstract:
In situ deposition of a thin (∼5 nm) layer of copper between Al and CuO layers is shown to increase the overall nanolaminate material reactivity. A combination of transmission electron microscopy imaging, in situ infrared spectroscopy, low energy ion scattering measurements, and first-principles calculations reveals that copper spontaneously diffuses into aluminum layers (substantially less in CuO layers). The formation of an interfacial Al:Cu alloy with melting temperature lower than pure Al metal is responsible for the enhanced reactivity, opening a route to controlling the stochiometry of the aluminum layer and increasing the reactivity of the nanoenergetic multilayer systems in general.
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