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Moiré Nanosphere Lithography.

Kai Chen1,2, Bharath Bangalore Rajeeva3, Zilong Wu3

  • 1†National Institute for Materials Science, International Center for Material Nanoarchitectonics (MANA), Tsukuba, 305-0044, Japan.

ACS Nano
|May 30, 2015
PubMed
Summary

We developed moiré nanosphere lithography (M-NSL) by stacking nanosphere layers to create moiré patterns. This technique fabricates complex nanostructures and gold nanostructures with unique optical properties.

Keywords:
metasurfacemoiré nanosphere lithographymoiré patternnanosphere lithographyplasmonsequential stacking

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Optics

Background:

  • Nanosphere lithography (NSL) is a scalable, cost-effective method for fabricating nanoparticle arrays.
  • Conventional NSL relies on spontaneous self-assembly of nanospheres.
  • Existing methods combine NSL with etching or deposition to create diverse nanoparticles.

Purpose of the Study:

  • To introduce a novel variant of NSL called moiré nanosphere lithography (M-NSL).
  • To extend the patterning capabilities of conventional NSL.
  • To fabricate complex nanostructures and study their optical properties.

Main Methods:

  • Sequential stacking of polystyrene nanosphere monolayers to form bilayer crystals.
  • Utilizing the in-plane rotation between stacked monolayers to generate moiré patterns.
  • Employing O2 plasma etching on the moiré patterns to create masks for nanostructure fabrication.

Main Results:

  • Successfully generated moiré patterns, deviating from thermodynamically stable configurations.
  • Fabricated complex nanostructures using etched moiré patterns as masks.
  • Created complementary gold nanostructures and investigated their optical properties.

Conclusions:

  • M-NSL offers a facile and versatile strategy for fabricating complex nanostructures.
  • This technique enables the creation of novel metasurfaces.
  • The developed method expands the possibilities of nanosphere lithography for advanced applications.