Multi-level single mode 2D polymer waveguide optical interconnects using nano-imprint lithography.

Area of Science:

• Photonics and Optical Engineering
• Materials Science and Nanotechnology

Background:

• Passive optical interconnects are crucial for data communication.
• Single-mode polymer waveguides offer a promising platform for integrated optics.
• UV nano-imprint lithography presents a scalable fabrication method.

Purpose of the Study:

• To demonstrate single and multi-layer passive optical interconnects using polymer waveguides fabricated via UV nano-imprint lithography.
• To investigate fabrication tolerances and quantify index contrast variations.
• To evaluate the performance of optical splitting and routing devices.

Main Methods:

• Fabrication of single-mode polymer waveguides using UV nano-imprint lithography.
• Experimental quantification of index contrast variations in fabricated waveguides.
• Characterization of 1x2 splitting devices (directional couplers, MMI interferometers) and 2D optical ports.
• Measurement of insertion loss and power imbalance for fabricated devices.

Main Results:

• Demonstration of single and multi-layer passive optical interconnects with low insertion loss (<0.45 dB).
• Achieved low power imbalance (0.02 ± 0.01 dB) in 1x2 splitting devices.
• Successful implementation of an 'optical via' for inter-plane signal transfer with <0.45 dB insertion loss.
• Fabrication tolerances were investigated and quantified.

Conclusions:

• UV nano-imprint lithography is a viable technique for fabricating high-performance passive optical interconnects.
• The demonstrated devices exhibit excellent optical performance suitable for advanced optical systems.
• This work contributes to the development of integrated photonic circuits for optical communication and computing.