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Plasma Lithography Surface Patterning for Creation of Cell Networks

Plasma Lithography Surface Patterning for Creation of Cell Networks

Published on: June 14, 2011

Patterning microfluidic device wettability with spatially-controlled plasma oxidation.

Samuel C Kim¹, David J Sukovich, Adam R Abate

¹Department of Bioengineering and Therapeutic Sciences, University of California San Francisco, San Francisco, California, USA. adam.abate@ucsf.edu.

|June 25, 2015

Summary

This summary is machine-generated.

Researchers developed a simpler way to create patterned wettability in microfluidic devices for making uniform double emulsions. This plasma oxidation technique is easier and more scalable than current chemical methods.

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Area of Science:

Microfluidics
Surface Science
Materials Science

Background:

Microfluidic devices enable the production of double emulsions with consistent properties.
Fabricating specific wettability patterns on these devices is crucial but often complex.

Purpose of the Study:

To introduce a simplified method for creating wettability patterns in microfluidic devices.
To enable the controlled formation of double emulsions using patterned wettability.

Main Methods:

Spatially-controlled plasma oxidation was employed to pattern the wettability of microfluidic surfaces.
The effectiveness of the patterned surfaces in forming double emulsions was evaluated.

Main Results:

The plasma oxidation method successfully created wettability patterns for double emulsion formation.
This technique demonstrated comparable performance to existing chemical methods.
The approach offers advantages in simplicity, reliability, and scalability for large-scale production.

Conclusions:

Spatially-controlled plasma oxidation is an effective and advantageous technique for patterning microfluidic device wettability.
This method simplifies the fabrication process for producing uniform double emulsions.
The technique is suitable for scalable manufacturing of microfluidic drop makers.