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Published on: February 11, 2016
An IrSi oxide film as a highly active water-oxidation catalyst in acidic media
Viet-Ha Tran1, Takeshi Yatabe, Takahiro Matsumoto
1Centre for Small Molecule Energy, Kyushu University, 744 Moto-oka, Nishi-ku, Fukuoka 819-0395, Japan. ogo.seiji.872@m.kyushu-u.ac.jp.
Abstract:
We report an acid-stable Si oxide-doped Ir oxide film (IrSi oxide film), made by metal organic chemical vapour deposition (MOCVD) of an Ir(V) complex for electrochemical water-oxidation. This is a successful improvement of catalytic ability and stability depending upon the pH of Ir oxide by doping of Si oxide. The turnover frequency (TOF) of the electrochemical water-oxidation by the IrSi oxide film is the highest of any Si oxide-doped Ir oxide materials and higher even than that of Ir oxide in acidic media.
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