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Concept and modeling analysis of a high fidelity multimode deformable mirror
Applied Optics
|July 21, 2015
Summary
This study introduces a novel high-fidelity multimode deformable mirror (DM) for advanced lithography. The developed DM effectively controls optical aberrations, meeting stringent lithography tool requirements.
Area of Science:
- Optical Engineering
- Nanotechnology
- Materials Science
Background:
- Conventional deformable mirrors (DM) face limitations in aberration control for advanced lithography.
- Advanced lithography tools demand high-precision aberration management for enhanced performance.
Purpose of the Study:
- To develop a high-fidelity multimode deformable mirror (DM) capable of controlling optical aberrations.
- To investigate actuator arrangement for optimal DM performance in lithography applications.
Main Methods:
- Utilized the principle that thin plate deformation mimics optical modes.
- Designed and tested a 36-actuator deformable mirror (DM).
- Examined actuator arrangement for generating specific optical aberration modes.
Main Results:
- The 36-actuator DM accurately generated low-order Zernike modes (Z4-Z8) with <0.5% error.
- High-fidelity replication of fifth-order (Z10-Z14) and seventh-order (Z17-Z20) aberrations was achieved with <1.1% error.
- Demonstrated DM's capability to control aberrations for the first 20 Zernike modes.
Conclusions:
- The developed high-fidelity multimode DM meets the aberration control demands of advanced lithography tools.
- The DM's design based on optical mode deformation offers a viable solution for precision optical systems.
- This technology advances the potential for improved resolution and accuracy in lithographic processes.
