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Related Experiment Video

Updated: Apr 6, 2026

Digital Inline Holographic Microscopy DIHM of Weakly-scattering Subjects
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Extreme ultraviolet digital in-line holography using a tabletop source.

Michael Zürch, Christian Spielmann

    Applied Optics
    |July 21, 2015
    PubMed
    Summary

    Digital in-line holography (DIH) now uses extreme ultraviolet light for enhanced imaging. This breakthrough enables high-resolution phase-contrast and amplitude-contrast imaging of thin films below 1 micrometer.

    Area of Science:

    • Optics and Photonics
    • Materials Science
    • Nanotechnology

    Background:

    • Digital in-line holography (DIH) provides lensless, aberration-free imaging with inherent phase and amplitude contrast.
    • Extending DIH to shorter wavelengths can improve spatial and phase-contrast resolution.
    • Shorter wavelengths also enable the study of material properties beyond the optical domain.

    Purpose of the Study:

    • To demonstrate DIH experiments using an extreme ultraviolet (EUV) source at 38 nm wavelength.
    • To showcase phase-contrast imaging of ultrathin silicon nitride (SiN) membranes.
    • To utilize EUV absorption for amplitude-contrast imaging of thin films.

    Main Methods:

    • Coherent tabletop ultrafast high harmonic generation at 38 nm.
    • Twin-image-free holographic reconstruction scheme optimized for highly absorbing samples.

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  • DIH experiments on 15 nm thick silicon nitride sheets and other thin films.

    • Main Results:

    • Achieved phase-contrast imaging of 15 nm thick silicon nitride sheets.
    • Demonstrated amplitude-contrast imaging of thin films using strong EUV absorption.
    • Obtained spatial resolution below 1 micrometer for thin film imaging.

    Conclusions:

    • DIH at 38 nm enables high-resolution phase- and amplitude-contrast imaging of thin films.
    • The technique is crucial for detailed morphology determination in thin-film characterization.
    • EUV DIH opens new avenues for material analysis and applications.