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Updated: Apr 5, 2026

Atomically Traceable Nanostructure Fabrication

Atomically Traceable Nanostructure Fabrication

Published on: July 17, 2015

Atomically Traceable Nanostructure Fabrication.

Josh B Ballard¹, Don D Dick², Stephen J McDonnell³

¹Zyvex Labs; jballard@zyvexlabs.com.

Journal of Visualized Experiments : Jove

|August 15, 2015

Summary

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This summary is machine-generated.

This study presents a novel nanofabrication method for atomic-scale control, enabling the creation of nanostructures with linewidths down to 6 nm. This breakthrough paves the way for precise top-down fabrication of advanced nanoscale devices.

Area of Science:

Materials Science
Nanotechnology
Surface Science

Background:

Achieving nanostructures below 10 nm requires atomic-level understanding of fabrication processes.
Current methods lack precise control over feature size and density at the atomic scale.

Purpose of the Study:

To demonstrate a method for tracking and controlling atomically resolved structures throughout nanofabrication.
To establish a pathway for top-down atomic control in nanofabrication.

Main Methods:

Utilizing hydrogen depassivation lithography for initial patterning.
Employing selective atomic layer deposition of titania (2.8 nm) to create nanoscale etch masks.
Transferring patterns into bulk material via reactive ion etching.

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Multiscale Structures Aggregated by Imprinted Nanofibers for Functional Surfaces

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Last Updated: Apr 5, 2026

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A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics

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Multiscale Structures Aggregated by Imprinted Nanofibers for Functional Surfaces

Multiscale Structures Aggregated by Imprinted Nanofibers for Functional Surfaces

Published on: September 11, 2018

Main Results:

Fabrication of 20 nm tall nanostructures with linewidths as small as ~6 nm.
Demonstrated contrast indicating differential growth mechanisms on patterned versus H-passivated surfaces.
Successful fabrication of hole and line arrays to illustrate process limitations.

Conclusions:

The developed method offers a pathway towards top-down atomic control in nanofabrication.
Process integration, fiducial marking, and surface protection are critical considerations for practical application.
This technique advances the capability to engineer materials at the nanoscale with high precision.