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Published on: October 12, 2019
A Pathway to Type-I Band Alignment in Ge/Si Core-Shell Nanowires
Jongseob Kim1, Jung Hoon Lee2, Ki-Ha Hong3
1†Samsung Advanced Institute of Technology, Samsung Electronics Co., Ltd. San 14, Nongseo-Dong, Giheung-Gu, Yongin-Si, Gyeonggi-Do, 446-712, Korea.
Germanium/Silicon core-shell nanowires (CSNWs) can achieve electron quantum wells through band structure engineering. This enables high-speed quantum-well transistors for advanced logic applications.
Area of Science:
- Materials Science
- Condensed Matter Physics
- Nanotechnology
Background:
- Germanium/Silicon core-shell nanowires (Ge/Si CSNWs) are promising for advanced electronic devices.
- Understanding their electronic band structure is crucial for device optimization.
Purpose of the Study:
- To investigate the electronic band structures of Ge/Si CSNWs.
- To engineer an electron quantum well within Ge core atoms.
- To explore band alignment transitions and their relation to quantum confinement and strain.
Main Methods:
- First-principles calculations were employed to analyze electronic band structures.
- Charge density and band structure analyses were performed.
- The effects of quantum confinement and lattice strain were systematically studied.
Main Results:
- Band engineering via quantum confinement and lattice strain induces a type-I/II band alignment transition.
- Type-I band alignment creates an electron quantum well in Ge/Si CSNWs.
- The type-I/II transition correlates with a direct-to-indirect band gap transition.
- Nanowire directionality ([100], [111], [110]) and diameter influence band alignment.
- Compressive strain on [110] CSNWs can achieve type-I band alignment.
Conclusions:
- Ge/Si CSNWs can be engineered to exhibit type-I band alignment.
- This capability allows for the fabrication of both n-type and p-type quantum-well transistors.
- The engineered Ge/Si CSNWs are suitable for high-speed logic applications.
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