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Highly robust transparent and conductive gas diffusion barriers based on tin oxide
Andreas Behrendt1, Christian Friedenberger2, Tobias Gahlmann1
1Institute of Electronic Devices, University of Wuppertal, Rainer-Gruenter-Str. 21, 42119, Wuppertal, Germany.
Advanced Materials (Deerfield Beach, Fla.)
|August 28, 2015
Summary
Transparent tin oxide films offer superior gas diffusion barrier properties. These films provide excellent water vapor resistance and maintain electrical conductivity under harsh conditions, outperforming traditional materials.
Area of Science:
- Materials Science
- Thin Film Technology
- Nanotechnology
Background:
- Development of transparent conductive films is crucial for various electronic applications.
- Existing materials like Indium Tin Oxide (ITO) face limitations in performance and durability.
- Need for advanced gas diffusion barriers with high transparency and conductivity.
Purpose of the Study:
- To investigate tin oxide (SnOx) thin films as transparent and electrically conductive gas diffusion barriers.
- To evaluate the water vapor transmission rates (WVTR) of SnOx films.
- To assess the stability of SnOx electrical conductivity under damp heat conditions.
Main Methods:
- Atomic layer deposition (ALD) was used to grow SnOx thin films.
- Water vapor transmission rates (WVTR) were measured to quantify barrier performance.
- Electrical conductivity was tested under accelerated damp heat aging (85 °C/85% RH).
Main Results:
- SnOx films exhibited extremely low WVTR, on the order of 10(-6) g/(m(2) day), significantly better than ITO.
- Electrical conductivity of SnOx remained high even after exposure to damp heat conditions.
- Zinc oxide (ZnO) films showed a rapid degradation of electrical conductivity under similar conditions.
Conclusions:
- Tin oxide thin films are highly effective transparent gas diffusion barriers.
- SnOx offers superior durability and performance compared to ITO and ZnO in humid environments.
- ALD-grown SnOx presents a promising alternative for applications requiring robust transparent conductive barriers.
