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Published on: December 11, 2014
David S Barth1, Christopher Gladden1, Alessandro Salandrino1
1NSF Nano-scale Science and Engineering Center (NSEC), University of California Berkeley, Berkeley, CA, 94720, USA.
Photoelectrochemical etching of silicon creates refractive index gradients for advanced optical devices. This technique enables the fabrication and transfer of porous silicon layers for novel device applications.
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