Effect of Substrate Temperature on Ti/TiO2 Layers Growth Using a Combined Sputtering/Sol-Gel Combustion Method

A combined radio frequency sputtering/sol-gel combustion method was investigated in order to obtain optimum process condition for fabrication of a Titanium (Ti)/Titanium oxide (TiO2) films electrode of transparent conductive oxide-less dye-sensitized solar cells (TCO-less DSCs), Experimentally, the substrate temperature was changed from R.T. to 500 °C, and it was found that there existed an optimum value for efficient performance of the cell. The porous Ti layer with low sheet resistance (-2.5 Ω/sq.) can be prepared by substrate temperature 250 °C under RF power 300 W and Ar 8 mTorr. The efficiency (η) of the cell was 6.52% [FF: 0.76, VOC: 0.72 V, JSC: 11.91 mA/cm2].