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Phase shifting interferometry using a spatial light modulator to measure optical thin films.

Brenda Villalobos-Mendoza, Fermín S Granados-Agustín, Daniel Aguirre-Aguirre

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    This summary is machine-generated.

    This study introduces a novel method for measuring thin film steps using phase shifting interferometry (PSI) localized to specific regions. This technique accurately quantifies thin film thicknesses by applying PSI only where needed.

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    Area of Science:

    • Optics and Photonics
    • Metrology
    • Materials Science

    Background:

    • Accurate measurement of thin film step heights is crucial for microelectronics and nanotechnology.
    • Traditional interferometry methods can be time-consuming and may require complex sample preparation.
    • Phase shifting interferometry (PSI) offers high precision but is often applied over the entire field of view.

    Purpose of the Study:

    • To develop and validate a localized phase shifting interferometry (PSI) method for measuring thin film steps.
    • To demonstrate the effectiveness of using a spatial light modulator (SLM) for targeted phase shifting.
    • To quantify the accuracy of the proposed PSI technique for thin film metrology.

    Main Methods:

    • Utilized a Twyman-Green (T-G) interferometer incorporating a spatial light modulator (SLM Holoeye LC2012).
    • Applied phase shifts selectively to the region of interest containing thin film steps by controlling SLM gray levels (0-255).
    • Quantified phase shifts by analyzing fringe shifts in experimental interferograms before thin film measurement.

    Main Results:

    • Successfully quantified phase shifts induced by the SLM across its gray level range.
    • Experimental interferograms of thin film steps were accurately analyzed.
    • The thicknesses of thin film steps were successfully determined using the localized PSI method.

    Conclusions:

    • The developed method enables precise measurement of thin film steps by applying PSI only to the relevant areas.
    • The use of an SLM for localized phase shifting offers an efficient and adaptable approach for thin film metrology.
    • This technique provides a valuable tool for advanced thin film characterization in scientific and industrial applications.