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Flow-assisted Dielectrophoresis: A Low Cost Method for the Fabrication of High Performance Solution-processable Nanowire Devices
Published on: December 7, 2017
Interface Passivation and Trap Reduction via a Solution-Based Method for Near-Zero Hysteresis Nanowire Field-Effect
Marios Constantinou, Vlad Stolojan, Kiron Prabha Rajeev
1Department of Chemical Engineering, Texas Materials Institute and Center for Nano and Molecular Science and Technology, The University of Texas , Austin, Texas 78712-1062, United States.
This study presents a simple solution-based method to passivate silicon nanowires (Si NWs) using N,N-dimethylformamide (DMF). This treatment significantly reduces surface defects, leading to highly stable field-effect transistors (FETs) with minimal hysteresis.
Area of Science:
- Materials Science
- Nanotechnology
- Semiconductor Physics
Background:
- Silicon nanowires (Si NWs) are crucial for advanced electronic devices.
- Surface defects on Si NWs lead to poor device performance and instability.
- Existing passivation methods are often complex or inefficient.
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