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Neutral wetting brush layers for block copolymer thin films using homopolymer blends processed at high temperatures
M Ceresoli1, M Palermo, F Ferrarese Lupi
1Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, 20864 Agrate Brianza, MB, Italy. Dipartimento di Fisica, Università degli Studi di Milano, Via Celoria 16, Milano, 20133, Italy.
Nanotechnology
|September 26, 2015
Summary
Grafting polystyrene (PS-OH) and polymethylmethacrylate (PMMA-OH) onto SiO2 substrates creates a brush layer. This layer enables controlled self-assembly of block copolymers into ordered nanostructures like lamellae or cylinders.
Area of Science:
- Polymer Science
- Materials Science
- Surface Chemistry
Background:
- Grafting polymers onto surfaces is crucial for controlling interfacial properties.
- Block copolymers self-assemble into nanostructures, but substrate interactions can disrupt order.
- Hydroxyl-terminated polymers offer reactive sites for surface grafting.
Purpose of the Study:
- To investigate the grafting of polystyrene (PS-OH) and polymethylmethacrylate (PMMA-OH) homopolymer blends onto SiO2 substrates.
- To evaluate the effectiveness of the grafted brush layer in directing the self-assembly of PS-b-PMMA block copolymers.
- To identify processing parameters for achieving controlled nanostructure formation.
Main Methods:
- High-temperature, short-time thermal treatments for grafting PS-OH and PMMA-OH onto SiO2.
- Preparation of symmetric and asymmetric PS-b-PMMA block copolymer films.
- Characterization of the grafted brush layer and the resulting block copolymer nanostructures.
Main Results:
- Successful grafting of PS-OH/PMMA-OH blends onto SiO2 substrates.
- Demonstration of surface neutralization by adjusting blend composition and processing parameters.
- Formation of homogeneous, perpendicularly oriented lamellar or cylindrical textures in block copolymer films.
- Observation of simultaneous phase segregation and grafting, leading to a PS/PMMA bilayer structure.
Conclusions:
- The grafted brush layer effectively controls the self-assembly of PS-b-PMMA block copolymers.
- Surface polarity dictates preferential interaction with PMMA, forming a PMMA-rich layer.
- Tuning brush layer composition through PS chain diffusion allows precise control over nanostructure formation.
- This method provides a pathway for creating ordered polymer nanostructures on surfaces.
