λ/20 axial control in 2.5D polymerized structures fabricated with DLW lithography

Area of Science:

• Materials Science
• Nanotechnology
• Optics

Background:

• Precise control over nanoscale dimensions is crucial for advanced optical and electronic devices.
• Existing nanofabrication methods often face limitations in achieving sub-wavelength height accuracy.

Purpose of the Study:

• To develop a novel nanofabrication method for achieving unprecedented height control in 2.5D photopolymerized structures.
• To demonstrate the capability of inducing controlled resin expansion for nanometer-level height adjustments.

Main Methods:

• A one-pot, two-step nanofabrication process combining multiphoton direct laser writing (DLW) lithography with spatially-selective post-irradiation.
• Utilizing resin monomer photopolymerization followed by targeted irradiation to induce controlled expansion before development.

Main Results:

• Achieved astonishing λ/20 height control in 2.5D photopolymerized structures.
• Demonstrated nanometer-controlled height increase through induced resin expansion.
• Fabricated features with UV-visible-NIR sub-wavelength axial dimensions (~40 nm).

Conclusions:

• The developed nanofabrication method offers a highly precise and efficient approach for creating nanoscale structures.
• This technique enables the fabrication of advanced devices with potential applications in nanoelectronics and photonics.
• The induced expansion strategy provides a new pathway for sub-wavelength feature size control in photopolymerized materials.