Robust postfabrication trimming of ultracompact resonators on silicon on insulator with relaxed requirements on...

One of the main drawbacks of the high-index-contrast silicon-on-insulator platform in integrated photonics is the high sensitivity of the resonance wavelength of resonators to dimensional variations caused by fabrication imperfection. In this work, we experimentally demonstrate an accurate postfabrication trimming technique for compensating the fabrication-induced variations in the resonance properties of nanophotonic devices. Using this technique, we reduce the variation of the resonance wavelength of 4 μm diameter microdonut resonators by more than 1 order of magnitude to about 25 pm, which is adequate for most interconnect, optical signal processing, and sensing applications. In addition, our proposed technique has improved misalignment toleration and throughput compared to previous reports.