Development of a high magnetic field assisted pulsed laser deposition system

A high magnetic field assisted pulsed laser deposition (HMF-PLD) system has been developed to in situ grow thin films in a high magnetic field up to 10 T. In this system, a specially designed PLD cylindrical vacuum chamber is horizontally located in the bore configuration of a superconducting magnet with a bore diameter of 200 mm. To adjust the focused pulsed laser into the target in such a narrow PLD vacuum chamber, an ingeniously built-in laser leading-in chamber is employed, including a laser mirror with a reflection angle of 65° and a damage threshold up to 3.4 J/cm(2). A laser alignment system consisting of a built-in video-unit leading-in chamber and a low-energy alignment laser is applied to monitor and align the pulsed laser propagation in the PLD vacuum chamber. We have grown La0.7Sr0.3MnO3 (LSMO) thin films on (LaAlO3)0.3(Sr2AlTaO6)0.7 (001) [LSAT (001)] substrates by HMF-PLD. The results show that the nanostructures of the LSMO films can be tuned from an epitaxially continuous film structure without field to a vertically aligned nanorod structure with an applied high magnetic field above 5 T, and the dimension size of the nanorods can be tuned by the strength of the magnetic field. The associated magnetic anisotropy is found to be highly dependent on the nanorod structures. We show how the HMF-PLD provides an effective route toward tuning the nanostructures and the physical properties of functional thin films, giving it an important role in development of nanodevices and their application.