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Updated: Apr 1, 2026

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
Published on: January 19, 2020
Design and implementation of a micron-sized electron column fabricated by focused ion beam milling
Flavio Wicki1, Jean-Nicolas Longchamp1, Conrad Escher1
1Physics Department, University of Zurich, Winterthurerstrasse 190, 8057 Zurich, Switzerland.
Abstract:
We have designed, fabricated and tested a micron-sized electron column with an overall length of about 700 microns comprising two electron lenses; a micro-lens with a minimal bore of 1 micron followed by a second lens with a bore of up to 50 microns in diameter to shape a coherent low-energy electron wave front. The design criteria follow the notion of scaling down source size, lens-dimensions and kinetic electron energy for minimizing spherical aberrations to ensure a parallel coherent electron wave front. All lens apertures have been milled employing a focused ion beam and could thus be precisely aligned within a tolerance of about 300 nm from the optical axis. Experimentally, the final column shapes a quasi-planar wave front with a minimal full divergence angle of 4 mrad and electron energies as low as 100 eV.
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