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Reference of Temperature and Time during tempering process for non-stoichiometric FTO films
J K Yang1, B Liang1, M J Zhao1
1State Key Laboratory of Metastable Materials Science and Technology, College of Materials Science and Engineering, Yanshan University, Qinhuangdao 066004, China.
Scientific Reports
|October 15, 2015
Summary
Tempering Fluorine-doped tin oxide (FTO) films at 700°C for 260s optimizes their mechanical strength and electrical properties for Low-E glass applications. This process yields low resistivity and high transmittance, crucial for energy-efficient windows.
Area of Science:
- Materials Science
- Thin Film Technology
- Surface Science
Background:
- Low-Emissivity (Low-E) glass requires enhanced mechanical strength, often achieved through tempering.
- Fluorine-doped tin oxide (FTO) films are crucial for Low-E glass properties but require high-temperature processing.
- The tempering process significantly impacts the structural and electrical characteristics of FTO films.
Purpose of the Study:
- To investigate the effect of tempering temperature and time on FTO film properties.
- To determine optimal tempering conditions for enhancing FTO film performance.
- To correlate structural and electrical properties with tempering parameters.
Main Methods:
- Systematic variation of tempering temperatures (600–720°C) and times (150–300s).
- Analysis of FTO film structure using X-ray diffraction (XRD) and surface composition analysis.
- Electrical property measurements including resistivity and Hall mobility.
- Optical property measurements (transmittance) and emissivity calculations.
Main Results:
- All tempered FTO films were polycrystalline SnO2, with surface [O]/[Sn] ratios exceeding the stoichiometric value.
- Optimal tempering conditions identified at 700°C for 260s.
- FTO films tempered under optimal conditions exhibited a resistivity of 7.54 × 10⁻⁴ Ω·cm, ~80% average transmittance (400–800 nm), and an emissivity of 0.38.
- Hall mobility was primarily limited by ionized impurity scattering under optimal tempering.
Conclusions:
- Tempering temperature and time critically influence FTO film structural and electrical properties.
- Optimal tempering at 700°C for 260s yields high-performance FTO films suitable for Low-E glass.
- The study provides insights into optimizing FTO film fabrication for enhanced glass applications.
